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Evaluation of Fermi-Level in Doped Films of a-SiC:H by X-Ray Photoemission Spectroscopy
Fukada, Noboru, Fukushima, Yoshito, Imura, Takeshi, Hiraki, AkioVolume:
22
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.22.L745
Date:
November, 1983
File:
PDF, 493 KB
1983