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GaAs Radical Etching with a Cl 2 Plasma in a Reactive Ion Beam Etching System
Sugata, Sumio, Asakawa, KiyoshiVolume:
23
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.23.L564
Date:
August, 1984
File:
PDF, 572 KB
1984