Measurement of the Out-Diffusion Profile of Oxygen in...

Japanese Journal of Applied Physics 1985 / 10 Vol. 24; Iss. Part 1, No

Measurement of the Out-Diffusion Profile of Oxygen in Silicon

Sugita, Yoshimitsu, Kawata, Hiroshi, Nakamichi, Shuhei, Okabe, Toshio, Watanabe, Toshihide, Yoshikawa, Shigeo, Itoh, Yoshiko, Nozaki, Tadashi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
24
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.1302
Date:
October, 1985
File:
PDF, 1019 KB
1985
Conversion to is in progress
Conversion to is failed