Plasma Etching of CVD Grown Cubic SiC Single Crystals

Japanese Journal of Applied Physics 1985 / 11 Vol. 24; Iss. Part 2, No

Plasma Etching of CVD Grown Cubic SiC Single Crystals

Dohmae, Shinichi, Shibahara, Kentaro, Nishino, Shigehiro, Matsunami, Hiroyuki
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Volume:
24
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.L873
Date:
November, 1985
File:
PDF, 441 KB
1985
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