A Catalytic Effect of Hexafluorodisilane in Plasma Chemical Vapor Deposition of a-Si:H Films from Monosilane
Koinuma, Hideomi, Manako, Takashi, Fueki, KazuoVolume:
25
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.25.L471
Date:
June, 1986
File:
PDF, 331 KB
1986