High-Rate Deposition of a-Si:H Film with a Separated Plasma...

Japanese Journal of Applied Physics 1988 / 1 Vol. 27; Iss. Part 1, No

High-Rate Deposition of a-Si:H Film with a Separated Plasma Triode Method

Tanaka, Makoto, Ninomiya, Kunimoto, Nakamura, Noboru, Tsuda, Shinya, Nakano, Shoichi, Ohnishi, Michitoshi, Fuwano, Yukinori
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Volume:
27
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.27.14
Date:
January, 1988
File:
PDF, 991 KB
1988
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