![](/img/cover-not-exists.png)
High-Rate Deposition of a-Si:H Film with a Separated Plasma Triode Method
Tanaka, Makoto, Ninomiya, Kunimoto, Nakamura, Noboru, Tsuda, Shinya, Nakano, Shoichi, Ohnishi, Michitoshi, Fuwano, YukinoriVolume:
27
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.27.14
Date:
January, 1988
File:
PDF, 991 KB
1988