Effect of Dopant Concentration on Oxidation-Induced Stacking Faults in Boron-Doped CZ Silicon
Chichibu, Shigefusa, Harada, Tsuyoshi, Matsumoto, SatoruVolume:
27
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.27.L1543
Date:
August, 1988
File:
PDF, 349 KB
1988