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Sulfonamide-Phenolic Resin Negative Resist for KrF Excimer Laser Lithography
Yamaoka, Tsuguo, Nishiki, Masashi, Jin, Shun Ji, Kitamura, Jun, Koseki, Ken'ichiVolume:
28
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.28.2126
Date:
October, 1989
File:
PDF, 791 KB
1989