![](/img/cover-not-exists.png)
Highly Selective AlSiCu Etching Using BBr 3 Mixed-Gas Plasma
Yoneda, Masahiro, Sawai, Hisaharu, Fujiwara, Nobuo, Nishioka, Kyusaku, Abe, HaruhikoVolume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.2644
Date:
November, 1990
File:
PDF, 582 KB
1990