Fluorine-Doped Indium Oxide Thin Films Prepared by Chemical...

Japanese Journal of Applied Physics 1990 / 9 Vol. 29; Iss. Part 2, No

Fluorine-Doped Indium Oxide Thin Films Prepared by Chemical Vapor Deposition

Maruyama, Toshiro, Fukui, Kunihiro
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Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L1705
Date:
September, 1990
File:
PDF, 411 KB
1990
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