Experimental Fabrication of XMOS Transistors Using Lateral...

Japanese Journal of Applied Physics 1990 / 4 Vol. 29; Iss. Part 2, No

Experimental Fabrication of XMOS Transistors Using Lateral Solid-Phase Epitaxy of CVD Silicon Films

Ishii, Kenichi, Hayashi, Yutaka, Sekigawa, Toshihiro
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Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L521
Date:
April, 1990
File:
PDF, 554 KB
1990
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