Evaluation of Device Charging in Ion Implantation

Japanese Journal of Applied Physics 1991 / 11 Vol. 30; Iss. Part 1, No

Evaluation of Device Charging in Ion Implantation

Namura, Takashi, Ishikawa, Katsuya, Aoki, Norishige, Fukuzaki, Yoshiki, Todokoro, Yoshihiro, Inoue, Morio
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Volume:
30
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.30.3223
Date:
November, 1991
File:
PDF, 694 KB
1991
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