Photoinduced Deposition of Aluminum Thin Film on Silicon...

Japanese Journal of Applied Physics 1992 / 6 Vol. 31; Iss. Part 1, No

Photoinduced Deposition of Aluminum Thin Film on Silicon Nitride and Oxide

Ouchi, Hideki, Ishida, Kenji, Hanabusa, Mitsugu, Shogen, Satoshi, Kawasaki, Masahiro
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Volume:
31
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.31.1979
Date:
June, 1992
File:
PDF, 502 KB
1992
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