Silicidation Reaction and Stress in Ti/Si

Japanese Journal of Applied Physics 1992 / 2 Vol. 31; Iss. Part 1, No

Silicidation Reaction and Stress in Ti/Si

Chen, Shih-Chang, Tamura, Hiroyuki, Hara, Tohru, Kinoshita, Kei, Inoue, Ken, Endo, Nobuyuki, Nakamura, Shigeaki
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Volume:
31
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.31.201
Date:
February, 1992
File:
PDF, 780 KB
1992
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