![](/img/cover-not-exists.png)
Quantitative Analysis of Surface Contaminations on Si Wafers by Total Reflection X-Ray Fluorescence
Kondo, Hideyuki, Ryuta, Jiro, Morita, Etsuro, Yoshimi, Toshihiro, Shimanuki, YasushiVolume:
31
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.31.L11
Date:
January, 1992
File:
PDF, 636 KB
1992