Quantitative Analysis of Surface Contaminations on Si...

Japanese Journal of Applied Physics 1992 / 1 Vol. 31; Iss. Part 2, No

Quantitative Analysis of Surface Contaminations on Si Wafers by Total Reflection X-Ray Fluorescence

Kondo, Hideyuki, Ryuta, Jiro, Morita, Etsuro, Yoshimi, Toshihiro, Shimanuki, Yasushi
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Volume:
31
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.31.L11
Date:
January, 1992
File:
PDF, 636 KB
1992
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