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Ni-Silicide Formation: Dependence on Crystallographic Orientation of Si Substrates
Yamauchi, Shoichi, Hirai, Masaaki, Kusaka, Masahiko, Iwami, Motohiro, Nakamura, Hatsuo, Yokota, Yasuhiro, Akiyama, Akitsugu, Watabe, HirokuniVolume:
32
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.3237
Date:
July, 1993
File:
PDF, 4.05 MB
1993