AIN as a Dry-Etch Durable Resist for Electron and Ion Beam...

Japanese Journal of Applied Physics 1993 / 3 Vol. 32; Iss. Part 2, No

AIN as a Dry-Etch Durable Resist for Electron and Ion Beam Lithography

Tada, Tetsuya, Kanayama, Toshihiko
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Volume:
32
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.L458
Date:
March, 1993
File:
PDF, 494 KB
1993
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