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AIN as a Dry-Etch Durable Resist for Electron and Ion Beam Lithography
Tada, Tetsuya, Kanayama, ToshihikoVolume:
32
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.L458
Date:
March, 1993
File:
PDF, 494 KB
1993