Remote Plasma S...

Japanese Journal of Applied Physics 1994 / 6 Vol. 33; Iss. Part 1, No

Remote Plasma S i O 2 Deposition by Tetraethoxysilane with Chemically and Energetically Different Atomic Species

Wickramanayaka, Sunil, Matsumoto, Akinori, Nakanishi, Yoichiro, Hosokawa, Naokichi, Hatanaka, Yoshinori
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Volume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.3520
Date:
June, 1994
File:
PDF, 1.28 MB
1994
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