Reverse Annealing of Arsenic-Implanted Low-Pressure...

Japanese Journal of Applied Physics 1994 / 9 Vol. 33; Iss. Part 2, No

Reverse Annealing of Arsenic-Implanted Low-Pressure Chemical Vapor Deposition (LPCVD) Amorphous-Silicon Films

Tsai, Meng-Jin, Wang, Fang-Shin, Cheng, Huang-Chung
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Volume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L1254
Date:
September, 1994
File:
PDF, 566 KB
1994
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