Radical Control by Wall Heating of a Fluorocarbon Etching...

Japanese Journal of Applied Physics 1994 / 9 Vol. 33; Iss. Part 2, No

Radical Control by Wall Heating of a Fluorocarbon Etching Reactor

Ito, Satoshi, Nakamura, Keiji, Sugai, Hideo
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Volume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L1261
Date:
September, 1994
File:
PDF, 791 KB
1994
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