High-Rate Selective Etching of a-Si:H Using Hydrogen Radicals
Nagayoshi, Hiroshi, Yamaguchi, Misako, Kamisako, Koichi, Horigome, Takashi, Tarui, YasuoVolume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L621
Date:
May, 1994
File:
PDF, 497 KB
1994