Anomaly in Sputtering of Aluminum under...

Japanese Journal of Applied Physics 1996 / 8 Vol. 35; Iss. Part 1, No

Anomaly in Sputtering of Aluminum under N 2+ Ion Bombardment

Mitsuhashi, Riichirou, Lee, Hyung-Ik, Shimizu, Ryuichi
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Volume:
35
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.4545
Date:
August, 1996
File:
PDF, 385 KB
1996
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