Suppression of Boron Penetration in...

Japanese Journal of Applied Physics 1996 / 12 Vol. 35; Iss. Part 1, No

Suppression of Boron Penetration in B F 2+ -Implanted Poly-Si Gate

Chao, Tien Sheng, Chu, Chih-Hsun, Wang, Chuan Fu, Ho, Kuai Junz, Lei, Tan. Fu, Lee, Chung Len
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
35
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.6003
Date:
December, 1996
File:
PDF, 949 KB
1996
Conversion to is in progress
Conversion to is failed