High-Quality CVD/Thermal Stacked Gate Oxide Films with...

Japanese Journal of Applied Physics 1997 / 3 Vol. 36; Iss. Part 1, No

High-Quality CVD/Thermal Stacked Gate Oxide Films with Hydrogen-Free CVD S i O 2 Formed in a S i C l 4 – N 2O System

Ogata, Tamotsu, Kobayashi, Kiyoteru, Watanabe, Hajime, Kurokawa, Hiroshi, Matsui, Yasuji, Hirayama, Makoto
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
36
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.1360
Date:
March, 1997
File:
PDF, 755 KB
1997
Conversion to is in progress
Conversion to is failed