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Advanced Trench and Local Oxidation of Silicon (LOCOS) Isolation Technology for Ultra-Low-Power Bulk Dynamic Threshold Metal Oxide Semiconductor Field Effect Transistor (B-DTMOS)
Kotaki, Hiroshi, Adachi, Kouichirou, Sugimoto, Kazuo, Nakano, Masayuki, Kakimoto, Seizou, Fukushima, TakashiVolume:
36
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.7660
Date:
December, 1997
File:
PDF, 1.27 MB
1997