Influence of Interface Structure on Chemical Etching...

Japanese Journal of Applied Physics 1998 / 12 Vol. 37; Iss. Part 1, No

Influence of Interface Structure on Chemical Etching Process for Air Gap of Microelectromechanical System Based on Surface Micromachining

Yoon, Young Soo, Kim, Joon Han, Polla, Dennis. L., Shin, Young Hwa
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Volume:
37
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.37.7129
Date:
December, 1998
File:
PDF, 2.06 MB
1998
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