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Protection of Field Oxide in Trench Isolation against Contact Hole Etching to Improve Alignment Tolerance
Oishi, Toshiyuki, Shiozawa, Katsuomi, Sugihara, Kouhei, Abe, Yuji, Tokuda, YasunoriVolume:
37
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.37.L833
Date:
July, 1998
File:
PDF, 373 KB
english, 1998