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Residual Strain in Semi-Insulating InP Wafers Treated by Multiple-Step Wafer Annealing
Fukuzawa, Masayuki, Herms, Martin, Uchida, Masayuki, Oda, Osamu, Yamada, andMasayoshiVolume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.38.1156
Date:
February, 1999
File:
PDF, 90 KB
english, 1999