Analysis of Buried-Oxide Dielectric Breakdown Mechanism in...

Japanese Journal of Applied Physics 1999 / 4 Vol. 38; Iss. Part 1, No

Analysis of Buried-Oxide Dielectric Breakdown Mechanism in Low-Dose Separation by Implanted Oxygen (SIMOX) Substrates Fabricated by Internal Thermal Oxidation (ITOX) Process

Kawamura, Keisuke, Yano, Takayuki, Hamaguchi, Isao, Takayama, Seiji, Nagatake, Youichi, Matsumura, Atsuki
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Volume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.38.2477
Date:
April, 1999
File:
PDF, 419 KB
english, 1999
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