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Sub-0.10 µm Hole Fabrication Using Bilayer Silylation Process for 193 nm Lithography
Satou, Isao, Kuhara, Kouichi, Endo, Masataka, Morimoto, HiroakiVolume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.38.7008
Date:
December, 1999
File:
PDF, 1.29 MB
english, 1999