Elimination of X-Ray Photoelectron Diffraction Effect of...

Japanese Journal of Applied Physics 1999 / 7 Vol. 38; Iss. Part 2, No

Elimination of X-Ray Photoelectron Diffraction Effect of Si(100) for Accurate Determination of SiO2 Overlayer Thickness

Katayama, Toshiharu, Yamamoto, Hidekazu, Ikeno, Masahiko, Mashiko, Yoji, Kawazu, Satoru, Umeno, Masataka
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Volume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.38.L770
Date:
July, 1999
File:
PDF, 103 KB
english, 1999
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