Quantitative Characterization of Roughness at SiO...

Quantitative Characterization of Roughness at SiO 2 /Si Interfaces by Using Cross-sectional High-resolution Transmission Electron Microscopy

Ikarashi, Nobuyuki, Watanabe, Koji
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.39.1278
Date:
March, 2000
File:
PDF, 672 KB
english, 2000
Conversion to is in progress
Conversion to is failed