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Quantitative Characterization of Roughness at SiO 2 /Si Interfaces by Using Cross-sectional High-resolution Transmission Electron Microscopy
Ikarashi, Nobuyuki, Watanabe, KojiVolume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.39.1278
Date:
March, 2000
File:
PDF, 672 KB
english, 2000