Improvement of Electrical Properties of Pulsed Laser...

Japanese Journal of Applied Physics 2000 / 4 Vol. 39; Iss. Part 1, No

Improvement of Electrical Properties of Pulsed Laser Crystallized Silicon Films by Oxygen Plasma Treatment

Tsunoda, Yoshiyuki, Sameshima, Toshiyuki, Higashi, Seiichiro
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Volume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.39.1656
Date:
April, 2000
File:
PDF, 61 KB
english, 2000
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