Flat and Large Poly-Si Grains by a Continuous Process of...

Japanese Journal of Applied Physics 2000 / 8 Vol. 39; Iss. Part 2, No

Flat and Large Poly-Si Grains by a Continuous Process of Plasma-Enhanced Chemical Vapor Deposition of a-Si and Its Direct Laser Crystallization

Mimura, Akio, Shinagawa, Youmei, Kawachi, Genshirou, Onisawa, Kenichi, Minemura, Tetsurou, Hara, Masayuki, Ishida, Takeshige, Takeda, Tomohiko
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Volume:
39
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.39.L779
Date:
August, 2000
File:
PDF, 464 KB
english, 2000
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