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Device-Grade Amorphous Silicon Prepared by High-Pressure Plasma
Isomura, Masao, Kondo, Michio, Matsuda, AkihisaVolume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.41.1947
Date:
April, 2002
File:
PDF, 268 KB
english, 2002