![](/img/cover-not-exists.png)
CH 4 /N 2 Plasma Etching for Organic Low- k Dielectric Material
Nakagawa, Hideo, Morikawa, Yasuhiro, Takano, Midori, Tamaoka, Eiji, Hayashi, ToshioVolume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.41.5775
Date:
September, 2002
File:
PDF, 215 KB
english, 2002