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Measurements of the Depth Profile of the Refractive Indices in Oxide Films on SiC by Spectroscopic Ellipsometry
Iida, Takeshi, Tomioka, Yuichi, Yoshimoto, Kazuo, Midorikawa, Masahiko, Tukada, Hiroyuki, Orihara, Misao, Hijikata, Yasuto, Yaguchi, Hiroyuki, Yoshikawa, Masahito, Itoh, Hisayoshi, Ishida, Yuuki, YoshVolume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.41.800
Date:
February, 2002
File:
PDF, 102 KB
english, 2002