Behavior of Local Current Leakage in Stressed Gate SiO 2 Films Analyzed by Conductive Atomic Force Microscopy
Seko, Akiyoshi, Watanabe, Yukihiko, Kondo, Hiroki, Sakai, Akira, Zaima, Shigeaki, Yasuda, YukioVolume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.4683
Date:
July, 2004
File:
PDF, 269 KB
english, 2004