Temperature Dependence of Porogen Desorption from Low-...

Japanese Journal of Applied Physics 2005 / 4 Vol. 44; Iss. 4B

Temperature Dependence of Porogen Desorption from Low- k Porous Silica Films Incorporated with Ethylene Groups

Uchida, Yasutaka, Maruyama, Yoshiyuki, Katoh, Tomohiro, Ito, Yoshito, Ishida, Koichi
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.2316
Date:
April, 2005
File:
PDF, 311 KB
english, 2005
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