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Behavior of Metal-Induced Negative Oxide Charges on the Surface of N-type Silicon Wafers Using Frequency-Dependent AC Surface Photovoltage Measurements
Shimizu, Hirofumi, Shin, Ryuhei, Ikeda, MasanoriVolume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.3778
Date:
June, 2005
File:
PDF, 142 KB
english, 2005