Growth Mechanism of Laser Annealing of Nickel-Induced...

Japanese Journal of Applied Physics 2006 / 1 Vol. 45; Iss. 1A

Growth Mechanism of Laser Annealing of Nickel-Induced Lateral Crystallized Silicon Films

Hu, Guo-Ren, Wu, YewChung Sermon, Chao, Chi-Wei, Shih, Hsieh-Chih
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Volume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.21
Date:
January, 2006
File:
PDF, 605 KB
english, 2006
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