Robust Ultrathin Oxynitride with High Nitrogen Diffusion...

Japanese Journal of Applied Physics 2006 / 6 Vol. 45; Iss. 6A

Robust Ultrathin Oxynitride with High Nitrogen Diffusion Barrier near its Surface Formed by NH 3 Nitridation of Chemical Oxide and Reoxidation with O 2

Lai, Chiung Hui, Lin, Bo Chun, Chang, Kow Ming, Hsieh, Kuang Yeu, Lai, Yi Lung
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Volume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.4898
Date:
June, 2006
File:
PDF, 270 KB
english, 2006
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