Optical Emission Spectrometry of Plasma in Low-Damage Sub-100 nm Tungsten Gate Reactive Ion Etching Process for Compound Semiconductor Transistors
Li, Xu, Zhou, Haiping, Wilkinson, Chris D. W., Thayne, Iain G.Volume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.8364
Date:
October, 2006
File:
PDF, 185 KB
english, 2006