Critical Dimension Control for 32 nm Node Random Contact...

Japanese Journal of Applied Physics 2008 / 2 Vol. 47; Iss. 2

Critical Dimension Control for 32 nm Node Random Contact Hole Array Using Resist Reflow Process

Park, Joon-Min, Kang, Young-Min, Hong, Joo-Yoo, Oh, Hye-Keun
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Volume:
47
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.47.1158
Date:
February, 2008
File:
PDF, 203 KB
english, 2008
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