Modification of the Mechanical Properties of SiO...

Japanese Journal of Applied Physics 2008 / 6 Vol. 47; Iss. 6

Modification of the Mechanical Properties of SiO 2 Thin Film Using Plasma Treatments for Micro-Electro-Mechanical Systems Applications

Su, Wang-Shen, Huang, Hsin-Yu, Fang, Weileun
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Volume:
47
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.47.5242
Date:
June, 2008
File:
PDF, 302 KB
english, 2008
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