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Real-Time Measurement of W, TiN, and TaSiN Thicknesses Comprising Full-Metal Gates during Plasma Etching by Optical Interference of Etching Plasma
Iwakoshi, Takehisa, Ono, Tetsuo, Aoyama, Takayuki, Nara, Yasuo, Ohji, Yuzuru, Joo, Kazuhiro, Saito, GoVolume:
47
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.47.6849
Date:
August, 2008
File:
PDF, 276 KB
english, 2008