Observation of Dislocation Motion in Si...

Japanese Journal of Applied Physics 2009 / 2 Vol. 48; Iss. 2

Observation of Dislocation Motion in Si 1- x Ge x Thin Film on Si Substrate by Laser Scattering Method

Hara, Akito, Tamura, Naoyoshi, Nakamura, Tomoji
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Volume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.020204
Date:
February, 2009
File:
PDF, 264 KB
english, 2009
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