Loss Reduction of Si Wire Waveguide Fabricated by...

Japanese Journal of Applied Physics 2009 / 3 Vol. 48; Iss. 3

Loss Reduction of Si Wire Waveguide Fabricated by Edge-Enhancement Writing for Electron Beam Lithography and Reactive Ion Etching Using Double Layered Resist Mask with C 60

Inoue, Keita, Plumwongrot, Dhanorm, Nishiyama, Nobuhiko, Sakamoto, Shinichi, Enomoto, Haruki, Tamura, Shigeo, Maruyama, Takeo, Arai, Shigehisa
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.030208
Date:
March, 2009
File:
PDF, 273 KB
english, 2009
Conversion to is in progress
Conversion to is failed