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Loss Reduction of Si Wire Waveguide Fabricated by Edge-Enhancement Writing for Electron Beam Lithography and Reactive Ion Etching Using Double Layered Resist Mask with C 60
Inoue, Keita, Plumwongrot, Dhanorm, Nishiyama, Nobuhiko, Sakamoto, Shinichi, Enomoto, Haruki, Tamura, Shigeo, Maruyama, Takeo, Arai, ShigehisaVolume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.030208
Date:
March, 2009
File:
PDF, 273 KB
english, 2009