Roughness Reduction in Polycrystalline Silicon Thin Films...

Japanese Journal of Applied Physics 2009 / 4 Vol. 48; Iss. 4

Roughness Reduction in Polycrystalline Silicon Thin Films Formed by Continuous-Wave Laser Lateral Crystallization with Cap SiO 2 Thin Films

Fujii, Shuntaro, Kuroki, Shin-Ichiro, Numata, Masayuki, Kotani, Koji, Ito, Takashi
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Volume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.04C129
Date:
April, 2009
File:
PDF, 479 KB
english, 2009
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