Hard-Mask-Through UV-Light-Induced Damage to Low-...

Japanese Journal of Applied Physics 2010 / 4 Vol. 49; Iss. 4

Hard-Mask-Through UV-Light-Induced Damage to Low- k Film during Plasma Process for Dual Damascene

Matsunaga, Noriaki, Okumura, Hirokatsu, Jinnai, Butsurin, Samukawa, Seiji
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Volume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.04DB06
Date:
April, 2010
File:
PDF, 881 KB
english, 2010
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